Heynova (Shanghai) New Material Technology CO., Ltd.
Heynova (Shanghai) New Material Technology CO., Ltd.
2,3,4,4'-Tetrahydroxybenzophenone 1,2-Naphthoquinonediazido-5-Sulfonate 107761-81-9 C23H15N2O8S

2,3,4,4'-Tetrahydroxybenzophenone 1,2-Naphthoquinonediazido-5-Sulfonate 107761-81-9 C23H15N2O8S

CAS No.: 107761-81-9

Product name: 2,3,4,4'-Tetrahydroxybenzophenone 1,2-Naphthoquinonediazido-5-Sulfonate

Appearance: Solid granules, powders

Purity(HPLC): ≥99%

Molecular formula: C23H15N2O8S

Molecular weight: 479.44

Package: In Aluminum foil bag, cartons outside.

Storage: Preserve in a well-closed container and keep in refrigerated environment.

2,3,4,4'-Tetrahydroxybenzophenone 1,2-Naphthoquinonediazido-5-Sulfonate 107761-81-9 C23H15N2O8S

What Is 107761-81-9 DNQ Photoactive Compound?

2,3,4,4'-Tetrahydroxybenzophenone 1,2-Naphthoquinonediazido-5-Sulfonate (CAS 107761-81-9) is a DNQ-based photoactive compound used in positive photoresist systems. As a key component in pac photoresist formulations, it contributes to exposure-induced dissolution behavior and is different from photoacid generators (PAGs) used in chemically amplified photoresists.

Heynova provides product information including HPLC purity, molecular formula, molecular weight, packaging and storage details. Product specifications, SDS and sample availability can be provided for further evaluation.


DNQ Photoactive Compound for Positive Photoresist Applications

CAS 107761-81-9 is used as a DNQ-based photoactive compound in positive photoresist materials formulations, where the photosensitive component works together with resin and solvent systems to control exposure-dependent dissolution behavior.

The final performance of a photoresist formulation depends on multiple factors, including the selected resin, solvent composition, photoactive compound concentration, exposure conditions and development process.

When evaluating this material, formulation teams typically consider:

Evaluation FactorDescription
Photoactive compound compatibilityInteraction with the selected resin system
Solubility behaviorCompatibility with formulation solvents
Exposure responsePerformance under the intended exposure conditions
Development behaviorDissolution difference before and after exposure
Material purityHPLC purity and relevant impurity control


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Related Photosensitizer (PAC)
2,3,4,4'-Tetrahydroxybenzophenone 1,2-Naphthoquinonediazido-5-Sulfonate 107761-81-9 C23H15N2O8S
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