Heynova (Shanghai) New Material Technology CO., Ltd.
Heynova (Shanghai) New Material Technology CO., Ltd.
2-Methyl-2-Propenoic Acid 2-Oxo-2-[(5-Oxo-4-Oxatricyclo[4.3.1.13,8] undec-2-Yl)oxy]ethyl Ester (m111) 1338917-24-0 C16H20O6

2-Methyl-2-Propenoic Acid 2-Oxo-2-[(5-Oxo-4-Oxatricyclo[4.3.1.13,8] undec-2-Yl)oxy]ethyl Ester (m111) 1338917-24-0 C16H20O6

CAS No.: 1338917-24-0

Product name: 2-Methyl-2-Propenoic Acid 2-Oxo-2-[(5-Oxo-4-Oxatricyclo[4.3.1.13,8]undec-2-Yl)oxy]ethyl Ester(m111)

Purity(HPLC): ≥99%

Metal ion content: ≤50 ppb each

Molecular formula: C16H20O6

Molecular weight: 308.33

Storage: Preserve in a well-closed container and keep in refrigerated environment.

2-Methyl-2-Propenoic Acid 2-Oxo-2-[(5-Oxo-4-Oxatricyclo[4.3.1.13,8] undec-2-Yl)oxy]ethyl Ester (m111) 1338917-24-0 C16H20O6
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Related Photoresist Monomer
2-Methyl-2-Propenoic Acid 2-Oxo-2-[(5-Oxo-4-Oxatricyclo[4.3.1.13,8] undec-2-Yl)oxy]ethyl Ester (m111) 1338917-24-0 C16H20O6
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