Heynova (Shanghai) New Material Technology CO., Ltd.
Heynova (Shanghai) New Material Technology CO., Ltd.
2-Propenoic Acid, 2-Methyl-, 2-[(2-Methyltricyclo[3.3.1.13,7]dec-2-Yl)oxy]-2-Oxoethyl Ester 869496-41-3 C17H24O4

2-Propenoic Acid, 2-Methyl-, 2-[(2-Methyltricyclo[3.3.1.13,7]dec-2-Yl)oxy]-2-Oxoethyl Ester 869496-41-3 C17H24O4

CAS No.: 869496-41-3

Product name: 2-Propenoic Acid, 2-Methyl-, 2-[(2-Methyltricyclo[3.3.1.13,7]dec-2-Yl)oxy]-2-Oxoethyl Ester

Purity(HPLC): ≥99%

Metal ion content: ≤50 ppb each

Molecular formula: C17H24O4

Molecular weight: 292.37

Storage: Preserve in a well-closed container and keep in refrigerated environment.

2-Propenoic Acid, 2-Methyl-, 2-[(2-Methyltricyclo[3.3.1.13,7]dec-2-Yl)oxy]-2-Oxoethyl Ester 869496-41-3 C17H24O4
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Related Photoresist Monomer
2-Propenoic Acid, 2-Methyl-, 2-[(2-Methyltricyclo[3.3.1.13,7]dec-2-Yl)oxy]-2-Oxoethyl Ester 869496-41-3 C17H24O4
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