Photoresist solvent is one of the key components of photoresist, which is mainly used to dissolve the resin, photoresist and other components, adjust the viscosity and drying characteristics of the glue. The company's photoresist solvent products, high purity, metal impurities control in ppb level, effectively avoiding the pollution of the wafer. With good solubility, can quickly dissolve the resin, photoresist and other components within the photoresist, to ensure that the adhesive is uniform and stable. In terms of volatilization characteristics, it has a suitable volatilization rate and can form a flat film after coating to avoid defects such as pinholes and cracks.
The core advantages of our photoresist solvents lie in their high purity, precise control ability and process adaptability:
Ultra-high purity: Semiconductor-grade solvents to ensure that the photoresist is free of defects and improve chip yield.
Performance optimization: Through the mixing of solvents to accurately adjust the evaporation rate and surface tension, to achieve film thickness uniformity ± 1%.
Process compatibility: Adaptable to EUV/ArF/KrF lithography system, low outgassing formula to reduce the pollution of optical components.
Green and safe: Some products use bio-based solvents, in line with REACH environmental standards.
Stable supply: Large-scale production to ensure batch consistency (RSD <1%), to meet the needs of wafer fabs for mass production.
The key applications of the company's photoresist solvents in semicon-ductor, display panel and related fields are as follows:
IC manufacturing: As the carrier of resin/photosensitizer, PGMEA, cyclohexanone and other solvents ensure the uniformity of photoresist spin-coating, and are suitable for the whole process of G-line/I-line, KrF, ArF and EUV.
Display panel processing: In OLED/LCD manufacturing, glycol ether solvents are used for photoresist patterning to realize micron-level pixel array etching.
Advanced packaging: In the TSV (Through-Silicon Vias) process, high purity solvents are used to ensure photoresist fluidity and graphic fidelity during deep hole filling.
MEMS devices: Microstructure processing such as biosensors rely on low residual solvents to avoid device contamination.
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