Heynova (Shanghai) New Material Technology CO., Ltd.
Heynova (Shanghai) New Material Technology CO., Ltd.
News

News

News
  • Photoresist Solvent
    2026/02/06

    Photoresist solvents are key components in photoresist formulations, primarily serving to dissolve solid constituents such as resins, photoinitiators, and additives into a uniform, stable liquid photo...

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  • Polyimide (PI) Resin
    2026/02/05

    Polyimide resin is a high-performance polymer featuring an imide ring in its main chain. It combines exceptional high-temperature resistance, high mechanical strength, outstanding dielectric propertie...

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  • OLED Intermediate Materials
    2026/01/30

    OLED intermediates serve as the core building blocks for synthesizing functional materials in organic light-emitting diodes (OLEDs). They act as the critical link between basic chemical raw materials ...

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  • Monomer for Semiconductor Photoresist
    2026/01/29

    Photoresist monomers are the core raw materials forming the backbone of photoresist resins. Their molecular structures determine key properties such as light transmittance, etch resistance, and acid s...

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  • Photoresist Photosensitive Compound (PAC)
    2026/01/27

    Photoactive Compounds (PAC) are a class of substances that undergo photodecomposition, cross-linking, isomerization, and other chemical reactions when exposed to light of specific wavelengths. These r...

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  • PI for Thermal Graphite Film
    2026/01/20

    Thermal graphite film is a novel thermal management material, also known as thermal graphite sheets or heat dissipation graphite film. Its primary component is carbon, featuring a unique layered hexag...

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  • List of Commonly Used Monomers in CPI
    2026/01/17

    Traditional polyimides exhibit a brownish-yellow color in the visible light spectrum due to charge-transfer complexes (CTCs) within their molecular structure. Transparent polyimides suppress CTC forma...

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  • Optical Proximity Effect and Correction Techniques
    2026/01/16

    Optical Proximity Effect (OPE) in lithography refers to the deviation between the actual pattern formed on photoresist and the designed pattern on the mask plate, caused by optical phenomena such as d...

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  • Bottom Anti-Reflection Coating (BARC) for Photoresist
    2025/12/29

    The Bottom Anti-Reflection Coating (BARC) is an essential supporting material in deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography processes. Applied between the photoresist and the waf...

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  • Performance Requirements and Modification Techniques for Soluble PI
    2025/12/26

    The solubility of polyimide (PI) is one of the core bottlenecks in its processing and application. The polyimide molecular chain contains a large number of rigid aromatic ring structures, and strong h...

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Contact us to learn more about our advanced electronic chemicals and speciality polymer materials, and how they can enhance your production performances.

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